Book "Fundamentals of Resist Materials and Process Optimization"
We consolidate foundational technologies and know-how related to photoresist materials that are essential for semiconductors, displays, printed circuit boards, and more.
This book covers a wide range of areas related to photoresist technology and is structured to provide meaningful content as a practical guide. Specifically, it comprehensively addresses photoresist materials, processes, evaluation and analysis, and processing equipment, including essential technologies for yield improvement and troubleshooting, such as pattern defects, to assist engineers dealing with photoresist materials. 【Features of this book】 ➢ Essential resist materials for semiconductors, displays, printed circuit boards, etc. ➢ Comprehensive coverage of photoresist materials, processes, evaluation and analysis, and processing equipment ➢ Aiming to acquire the fundamentals and know-how of technologies that can meet device product specifications ➢ Detailed description of essential technologies for yield improvement and troubleshooting, such as pattern defects ➢ Supporting the resolution of issues such as quality improvement of photoresist materials and process optimization ➢ A functional volume that consolidates foundational technologies and know-how related to photoresist.
- Company：シーエムシー・リサーチ
- Price：Other
